The potential of functional scaling
| dc.citation.epage | 35 | en_US |
| dc.citation.issue | 1 | en_US |
| dc.citation.spage | 27 | en_US |
| dc.citation.volume | 21 | en_US |
| dc.citation.woscount | 9 | |
| dc.contributor.author | Chin, A | en_US |
| dc.contributor.author | McAlister, SP | en_US |
| dc.contributor.department | 奈米科技中心 | zh_TW |
| dc.contributor.department | Center for Nanoscience and Technology | en_US |
| dc.date.accessioned | 2014-12-08T15:36:58Z | |
| dc.date.available | 2014-12-08T15:36:58Z | |
| dc.date.issued | 2005-01-01 | en_US |
| dc.identifier.doi | 10.1109/MCD.2005.1388766 | en_US |
| dc.identifier.issn | 8755-3996 | en_US |
| dc.identifier.journal | IEEE CIRCUITS & DEVICES | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1109/MCD.2005.1388766 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/25366 | |
| dc.identifier.wosnumber | WOS:000227072100004 | |
| dc.language.iso | en_US | en_US |
| dc.title | The potential of functional scaling | en_US |
| dc.type | Article | en_US |