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Isoelectronic As doping effects on the optical characteristics of GaN films grown by metalorganic chemical-vapor deposition

dc.citation.epage2821en_US
dc.citation.issue18en_US
dc.citation.spage2819en_US
dc.citation.volume77en_US
dc.citation.woscount16
dc.contributor.authorHuang, HYen_US
dc.contributor.authorLin, WCen_US
dc.contributor.authorLee, WHen_US
dc.contributor.authorShu, CKen_US
dc.contributor.authorLiao, KCen_US
dc.contributor.authorChen, WKen_US
dc.contributor.authorLee, MCen_US
dc.contributor.authorChen, WHen_US
dc.contributor.authorLee, YYen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:44:44Z
dc.date.available2014-12-08T15:44:44Z
dc.date.issued2000-10-30en_US
dc.description.abstractWe have studied the As doping effects on the optical characteristics of GaN films by time-integrated photoluminescence and time-resolved photoluminescence. When As is incorporated into the film, the localized defect levels and donor-acceptor pair transition become less resolved. The recombination lifetime of neutral-donor-bound exciton (I-2) transition in undoped GaN increases with temperature as T-1.5. However, the I-2 recombination lifetime in As-doped GaN first decreases exponentially from 98 to 41 ps between 12 and 75 K, then increases gradually to 72 ps at 250 K. Such a difference is related to the isoelectronic As impurities in GaN, which generate nearby shallow levels that dominate the recombination process. (C) 2000 American Institute of Physics. [S0003-6951(00)01941-0].en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30195
dc.identifier.wosnumberWOS:000090016800013
dc.language.isoen_USen_US
dc.titleIsoelectronic As doping effects on the optical characteristics of GaN films grown by metalorganic chemical-vapor depositionen_US
dc.typeArticleen_US

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