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Fabrication and physical properties of radio frequency sputtered ZnMnSe thin films

dc.citation.epage4430en_US
dc.citation.issue7Aen_US
dc.citation.spage4427en_US
dc.citation.volume36en_US
dc.citation.woscount7
dc.contributor.authorTsai, CTen_US
dc.contributor.authorChuu, DSen_US
dc.contributor.authorLeou, JYen_US
dc.contributor.authorChou, WCen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:01:38Z
dc.date.available2014-12-08T15:01:38Z
dc.date.issued1997-07-01en_US
dc.description.abstractZn1-xMnxSe thin films with various Mn concentrations were produced by the radio frequency sputtering technique. As the Mn concentration increased, it was found that two types of crystal structures (zinc blende and wurtzite) compete with each other. The grain size of the Zn1-xMnx Se thin films decreased as Mn concentration x was increased. Moreover, the zone-center optical phonons of Zn1-xMnxSe thin films exhibit an intermediate mode behavior which is consistent with that of the bulk crystals.en_US
dc.identifier.doi10.1143/JJAP.36.4427en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.36.4427en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/458
dc.identifier.wosnumberWOS:A1997XR22300044
dc.language.isoen_USen_US
dc.subjectrf sputteringen_US
dc.subjectzinc blendeen_US
dc.subjectwurtziteen_US
dc.subjectintermediate mode behavioren_US
dc.titleFabrication and physical properties of radio frequency sputtered ZnMnSe thin filmsen_US
dc.typeArticleen_US

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