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AN ACCURATE AND ANALYTIC THRESHOLD-VOLTAGE MODEL FOR SMALL-GEOMETRY MOSFETS WITH SINGLE-CHANNEL ION-IMPLANTATION IN VLSI

dc.citation.epage1269en_US
dc.citation.issue12en_US
dc.citation.spage1263en_US
dc.citation.volume28en_US
dc.citation.woscount5
dc.contributor.authorWU, CYen_US
dc.contributor.authorHUANG, GSen_US
dc.contributor.authorCHEN, HHen_US
dc.contributor.authorTSENG, FCen_US
dc.contributor.authorSHIH, CTen_US
dc.contributor.department工學院zh_TW
dc.contributor.departmentCollege of Engineeringen_US
dc.date.accessioned2014-12-08T15:06:13Z
dc.date.available2014-12-08T15:06:13Z
dc.date.issued1985-12-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4788
dc.identifier.wosnumberWOS:A1985AXH4700013
dc.language.isoen_USen_US
dc.titleAN ACCURATE AND ANALYTIC THRESHOLD-VOLTAGE MODEL FOR SMALL-GEOMETRY MOSFETS WITH SINGLE-CHANNEL ION-IMPLANTATION IN VLSIen_US
dc.typeArticleen_US

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