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New curvature-compensation technique for CMOS bandgap reference with sub-1-V operation

dc.citation.epage671en_US
dc.citation.issue8en_US
dc.citation.spage667en_US
dc.citation.volume53en_US
dc.citation.woscount34
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorChen, Jung-Shengen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:16:06Z
dc.date.available2014-12-08T15:16:06Z
dc.date.issued2006-08-01en_US
dc.description.abstractA new sub-I-V curvature-compensated CMOS bandgap reference, which utilizes the temperature-dependent currents generated from the parasitic n-p-n and p-n-p bipolar junction transistor devices in the CMOS process, is presented. The new proposed sub-l-V curvature-compensated CMOS bandgap reference has been successfully verified in a standard 0.25-mu m CMOS process. The experimental results have confirmed that, with the minimum supply voltage of 0.9 V, the output reference voltage at 536 mV has a temperature coefficient of 19.5 ppm/degrees C from 0 degrees C to 100 degrees C. With a 0.9-V supply voltage, the measured power noise rejection ratio is -25.5 dB at 10 kHz.en_US
dc.identifier.doi10.1109/TCSII.2006.876377en_US
dc.identifier.issn1057-7130en_US
dc.identifier.journalIEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS II-EXPRESS BRIEFSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/TCSII.2006.876377en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/11940
dc.identifier.wosnumberWOS:000240167600015
dc.language.isoen_USen_US
dc.subjectbandgap voltage referenceen_US
dc.subjectcurvature-compensation techniqueen_US
dc.subjecttemperature coefficienten_US
dc.subjectvoltage referenceen_US
dc.titleNew curvature-compensation technique for CMOS bandgap reference with sub-1-V operationen_US
dc.typeArticleen_US

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