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Structural and optical properties of buried InAs/GaAs quantum dots on GaAsSb buffer layer

dc.citation.epageen_US
dc.citation.issue18en_US
dc.citation.volume42en_US
dc.citation.woscount0
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorChang, Lien_US
dc.contributor.authorLin, P. Y.en_US
dc.contributor.authorChiang, C. H.en_US
dc.contributor.authorChen, J. F.en_US
dc.contributor.authorChi, T. W.en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:08:42Z
dc.date.available2014-12-08T15:08:42Z
dc.date.issued2009-09-21en_US
dc.description.abstractIn this work, we investigated the effect of a 1 nm thick GaAs(94.3)Sb(0.57) buffer layer on structural and optical properties of buried InAs quantum dots (QDs) and wetting layers (WLs) in GaAs using photoluminescence (PL) and transmission electron microscopy (TEM). The density and emission wavelength of the QDs on the buffer were increased due to the size and the shape modification in comparison with those without a buffer. PL analysis of the ground-state (GS) peak of the QDs on the buffer showed a red-shift of 18 meV with an enhanced intensity. In addition, PL and TEM show that the buffer has a weak effect on the WLs and no apparent changes occur for the buffer during QD deposition and the capping process.en_US
dc.identifier.doi10.1088/0022-3727/42/18/185106en_US
dc.identifier.issn0022-3727en_US
dc.identifier.journalJOURNAL OF PHYSICS D-APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1088/0022-3727/42/18/185106en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6665
dc.identifier.wosnumberWOS:000269557000027
dc.language.isoen_USen_US
dc.titleStructural and optical properties of buried InAs/GaAs quantum dots on GaAsSb buffer layeren_US
dc.typeArticleen_US

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