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Inverted Octagonal Surface Defects in a-Plane AlGaN/GaN Multiple Quantum Wells

dc.citation.epageH918en_US
dc.citation.issue9en_US
dc.citation.spageH915en_US
dc.citation.volume158en_US
dc.citation.woscount2
dc.contributor.authorHuang, Huei-minen_US
dc.contributor.authorChang, Chiao-yunen_US
dc.contributor.authorLu, Tien-changen_US
dc.contributor.authorYang, Chi-chinen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:37:44Z
dc.date.available2014-12-08T15:37:44Z
dc.date.issued2011en_US
dc.description.abstractThe structural properties of a-plane AlGaN/GaN multiple quantum wells grown on the r-plane sapphire substrate have been characterized. The pentagonal and inverted octagonal surface pits, consisting of several non-polar and semi-polar crystalline facets, are clearly observed and distinguished. The Al incorporation efficiency of the non-polar and semi-polar facets of these special inverted octagonal surface pits has been verified in the order of (11 (2) under bar2) < (10<(12)under bar>) < (1<(1)under bar>00) approximate to (11 (2) under bar0) < (20<(2)under bar>1) by cathodoluminescence measurements at room temperature. The evolution of these inverted octagonal surface pits could be due to the results of interaction between different stacking faults. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3610990] All rights reserved.en_US
dc.identifier.doi10.1149/1.3610990en_US
dc.identifier.issn0013-4651en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3610990en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25946
dc.identifier.wosnumberWOS:000293175600064
dc.language.isoen_USen_US
dc.titleInverted Octagonal Surface Defects in a-Plane AlGaN/GaN Multiple Quantum Wellsen_US
dc.typeArticleen_US

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