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Epitaxial GaAs and pHEMT on aluminum-transformed AlAs nanofilms

dc.citation.volume8en_US
dc.citation.woscount0en_US
dc.contributor.authorCheng, Chia-Chuen_US
dc.contributor.authorWu, Chu-Chunen_US
dc.contributor.authorFan, Yen-Tingen_US
dc.contributor.authorWu, Jenq-Shinnen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2019-04-02T06:00:22Z
dc.date.available2019-04-02T06:00:22Z
dc.date.issued2018-09-01en_US
dc.description.abstractHeterogeneous epitaxial growth between semiconductors and metals boosts novel device development and enables various applications. In this work, we have investigated the epitaxial growth of GaAs layers on top of a nanoscale aluminium-transformed AlAs film. The grown GaAs layers are single-crystalline and of highquality, that has been evidenced by using various material characterization methods and by fabricating their high-electron mobility transistors. We found that an intriguing process named as "arsenidation" of aluminium film plays a key role in the successful epitaxy. Our work opens a window for growing semiconductor/metal hetero-structures for various device applications in the future. (C) 2018 Author(s).en_US
dc.identifier.doi10.1063/1.5040382en_US
dc.identifier.issn2158-3226en_US
dc.identifier.journalAIP ADVANCESen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5040382en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/148233
dc.identifier.wosnumberWOS:000446058000029en_US
dc.language.isoen_USen_US
dc.titleEpitaxial GaAs and pHEMT on aluminum-transformed AlAs nanofilmsen_US
dc.typeArticleen_US

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