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Simulation of InGaN quantum well laser performance using quaternary InAlGaN alloy as electronic blocking layer

dc.citation.epage7918en_US
dc.citation.issue11en_US
dc.citation.spage7916en_US
dc.citation.volume44en_US
dc.citation.woscount4
dc.contributor.authorChang, YAen_US
dc.contributor.authorLuo, CYen_US
dc.contributor.authorKu, HCen_US
dc.contributor.authorKuo, YKen_US
dc.contributor.authorLin, CFen_US
dc.contributor.authorWang, SCen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:18:07Z
dc.date.available2014-12-08T15:18:07Z
dc.date.issued2005-11-01en_US
dc.description.abstractLaser performance of an InGaN edge-emitting laser using a quaternary InAlGaN electronic blocking layer is investigated. Varying the aluminum (Al) composition in InAlGaN with a fixed indium (In) value (Al : In = 5 : 1) indicates that a lower threshold current and higher characteristic temperature (T(0)) value can be obtained when the Al composition is higher than 20%. When Al = 25%, the threshold current is reduced at the expense of a decreased To value from 149 to 130 K when the In composition increases from 1 to 7% in a temperature range of 300-370 K. The decreased T(0) value is mainly attributed to the increase in electronic leakage current.en_US
dc.identifier.doi10.1143/JJAP.44.7916en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.44.7916en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/13087
dc.identifier.wosnumberWOS:000233437400034
dc.language.isoen_USen_US
dc.subjectsemiconductor lasersen_US
dc.subjectquaternary InAlGaN alloysen_US
dc.subjectnumerical simulationen_US
dc.subjectelectronic blocking layeren_US
dc.subjectleakage currenten_US
dc.titleSimulation of InGaN quantum well laser performance using quaternary InAlGaN alloy as electronic blocking layeren_US
dc.typeArticleen_US

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