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Time-resolved photoluminescence study of isoelectronic In-doped GaN films grown by metalorganic vapor-phase epitaxy

dc.citation.epage3226en_US
dc.citation.issue22en_US
dc.citation.spage3224en_US
dc.citation.volume76en_US
dc.citation.woscount6
dc.contributor.authorHuang, HYen_US
dc.contributor.authorShu, CKen_US
dc.contributor.authorLin, WCen_US
dc.contributor.authorChuang, CHen_US
dc.contributor.authorLee, MCen_US
dc.contributor.authorChen, WKen_US
dc.contributor.authorLee, YYen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:45:15Z
dc.date.available2014-12-08T15:45:15Z
dc.date.issued2000-05-29en_US
dc.description.abstractTime-resolved photoluminescence spectra were used to characterize isoelectronically doped GaN:In films. Our results indicate that the recombination lifetime of the donor-bound-exciton transition of undoped GaN exhibits a strong dependence on temperature. When In is doped into the film, the recombination lifetime decreases sharply from 68 to 30 ps, regardless of the measured temperature and In source flow rate. These observations might be related to the isoelectronic In impurity itself in GaN, which creates shallow energy levels that predominate the recombination process. (C) 2000 American Institute of Physics. [S0003- 6951(00)02622-X].en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30510
dc.identifier.wosnumberWOS:000087239400022
dc.language.isoen_USen_US
dc.titleTime-resolved photoluminescence study of isoelectronic In-doped GaN films grown by metalorganic vapor-phase epitaxyen_US
dc.typeArticleen_US

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