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In-Plane Gate Transistors With a 40-mu m-Wide Channel Width

dc.citation.epage1129en_US
dc.citation.issue8en_US
dc.citation.volume33en_US
dc.citation.woscount3
dc.contributor.authorChung, Tung-Hsunen_US
dc.contributor.authorLin, Wei-Hsunen_US
dc.contributor.authorChao, Yi-Kaien_US
dc.contributor.authorChang, Shu-Weien_US
dc.contributor.authorLin, Shih-Yenen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:23:48Z
dc.date.available2014-12-08T15:23:48Z
dc.date.issued2012-08-01en_US
dc.description.abstractAn in-plane gate transistor with a GaAs/AlGaAs 2-D electron-gas channel about 40 mu m in width is investigated. The saturation region and the drain current modulation at different gate bias voltages are observed despite the wide channel. The surface-induced channel depletion is suggested as the main mechanism for the turn-off of the drain current at -10 V gate bias.en_US
dc.identifier.issn0741-3106en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/16603
dc.identifier.wosnumberWOS:000306923700011
dc.language.isoen_USen_US
dc.subjectIn-plane gate transistors (IPGTs)en_US
dc.subject2-D electron gas (2DEG)en_US
dc.titleIn-Plane Gate Transistors With a 40-mu m-Wide Channel Widthen_US
dc.typeArticleen_US

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