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Sensitivity enhancement in SiGe-on-insulator nanowire biosensor fabricated by top surface passivation

dc.citation.epage732en_US
dc.citation.issue8en_US
dc.citation.spage729en_US
dc.citation.volume7en_US
dc.citation.woscount1
dc.contributor.authorLai, Chiung-Huien_US
dc.contributor.authorChang, Kow-Mingen_US
dc.contributor.authorChen, Chu-Fengen_US
dc.contributor.authorHsieh, Cheng-Tingen_US
dc.contributor.authorWu, Chin-Ningen_US
dc.contributor.authorWang, Yu-Binen_US
dc.contributor.authorLiu, Chung-Hsienen_US
dc.contributor.authorChang, Kuo-Chinen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:24:24Z
dc.date.available2014-12-08T15:24:24Z
dc.date.issued2012-08-01en_US
dc.description.abstractThe oxidation caused by Ge condensation increases the Ge fraction in a SiGe-on-insulator (SGOI) and significantly increases the hole mobility. This effect can be exploited to improve the sensitivity of SGOI nanowires. However, previous studies have found that the sensitivity of SGOI nanowires degrades when the Ge fraction exceeds 20%, because a high Ge fraction destabilises the surface state of SiGe. In this work, a top surface passivation plasma-enhanced chemical vapour deposition SiO2 layer deposited on a Si0.8Ge0.2 nanowire improved its sensitivity by similar to 1.3 times that of the nanowire sample without a top passivation layer.en_US
dc.identifier.doi10.1049/mnl.2012.0214en_US
dc.identifier.issn1750-0443en_US
dc.identifier.journalMICRO & NANO LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1049/mnl.2012.0214en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/16924
dc.identifier.wosnumberWOS:000308562200009
dc.language.isoen_USen_US
dc.titleSensitivity enhancement in SiGe-on-insulator nanowire biosensor fabricated by top surface passivationen_US
dc.typeArticleen_US

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