RESISTANCE SWITCHING CHARACTERISTICS IN POLYCRYSTALLINE SILICON FILM RESISTORS
| dc.citation.epage | 1196 | en_US |
| dc.citation.issue | 5 | en_US |
| dc.citation.spage | 1193 | en_US |
| dc.citation.volume | 132 | en_US |
| dc.citation.woscount | 10 | |
| dc.contributor.author | LU, CY | en_US |
| dc.contributor.author | LU, NCC | en_US |
| dc.contributor.author | SHIH, CC | en_US |
| dc.contributor.department | 電控工程研究所 | zh_TW |
| dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:06:14Z | |
| dc.date.available | 2014-12-08T15:06:14Z | |
| dc.date.issued | 1985 | en_US |
| dc.identifier.issn | 0013-4651 | en_US |
| dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4811 | |
| dc.identifier.wosnumber | WOS:A1985AGJ2600041 | |
| dc.language.iso | en_US | en_US |
| dc.title | RESISTANCE SWITCHING CHARACTERISTICS IN POLYCRYSTALLINE SILICON FILM RESISTORS | en_US |
| dc.type | Article | en_US |