金屬薄膜與矽晶以及絻緣層界面反應研究(II)

dc.contributor.author	陳力俊	en_US
dc.contributor.author	CHEN LIH-JUANN	en_US
dc.contributor.department	交通大學電子工程系	zh_TW
dc.date.accessioned	2014-12-13T10:48:01Z
dc.date.available	2014-12-13T10:48:01Z
dc.date.issued	2000	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC89-2215-E009-008	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=542193&docId=99608	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/101215
dc.language.iso	zh_TW	en_US
dc.subject	金屬薄膜	zh_TW
dc.subject	矽	zh_TW
dc.subject	介電層	zh_TW
dc.subject	Metal thin film	en_US
dc.subject	Silicon	en_US
dc.subject	Dielectric layer	en_US
dc.title	金屬薄膜與矽晶以及絻緣層界面反應研究(II)	zh_TW
dc.title	Interfacial Reactions of Metal Thin Films on Silicon and Dielectric Layers (II)	en_US
dc.type	Plan	en_US

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