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CURRENT GAINS OF ALAS/GAAS TUNNELING EMITTER BIPOLAR-TRANSISTORS WITH 25-500-ANGSTROM BARRIER THICKNESS

dc.citation.epage1884en_US
dc.citation.issue21en_US
dc.citation.spage1883en_US
dc.citation.volume29en_US
dc.citation.woscount3
dc.contributor.authorCHEN, HRen_US
dc.contributor.authorLEE, CPen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorTSAI, KLen_US
dc.contributor.authorTSANG, JSen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:04:19Z
dc.date.available2014-12-08T15:04:19Z
dc.date.issued1993-10-14en_US
dc.description.abstractThe current gain of an AlAs/GaS tunnelling emitter bipolar transistor (TEBT) is found to increase monotonically with barrier thickness in the range 25-200 angstrom and fall off for barrier thickness increasing from 200 to 500 angstrom. It is found that a thicker barrier can suppress the base-to-emitter hole injection better and increase the current gain, but a barrier which is too thick decreases the current gain due to the suppression of the electron current.en_US
dc.identifier.issn0013-5194en_US
dc.identifier.journalELECTRONICS LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/2820
dc.identifier.wosnumberWOS:A1993NE96700051
dc.language.isoen_USen_US
dc.subjectSEMICONDUCTOR DEVICESen_US
dc.subjectHETEROJUNCTION BIPOLAR TRANSISTORSen_US
dc.subjectTUNNELING STRUCTURESen_US
dc.titleCURRENT GAINS OF ALAS/GAAS TUNNELING EMITTER BIPOLAR-TRANSISTORS WITH 25-500-ANGSTROM BARRIER THICKNESSen_US
dc.typeArticleen_US

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