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N incorporation into InGaAs cap layer in InAs self-assembled quantum dots

dc.citation.epageen_US
dc.citation.issue11en_US
dc.citation.volume98en_US
dc.citation.woscount3
dc.contributor.authorChen, JFen_US
dc.contributor.authorHsiao, RSen_US
dc.contributor.authorHsieh, PCen_US
dc.contributor.authorChen, YJen_US
dc.contributor.authorChen, YPen_US
dc.contributor.authorWang, JSen_US
dc.contributor.authorChi, JYen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:17:54Z
dc.date.available2014-12-08T15:17:54Z
dc.date.issued2005-12-01en_US
dc.description.abstractThis study presents the results of incorporating N into self-assembled InAs quantum dots (QDs) capped with an InGaAs cap layer. Experimental results indicate that such incorporation can redshift the QD ground state and decrease the energy spacing between the QD ground and first excited states. However, this incorporation reduces the potential barrier of the cap layer, increasing the electron escape from the QDs. Capacitance-voltage profiling shows that a broad shoulder corresponding to the electron emission from the QD ground to first-excited state cannot be resolved from the peak related to the electron emission from the excited states upon this incorporation. This finding implies that this incorporation reduces the energy spacing between the QD ground and first-excited states in the conduction band, thus correlating well with the photoluminescence data. In contrast, incorporating N directly into the InAs QD produces no redshift of the emission wavelength but introduces a deep trap at similar to 0.21 eV that depletes the electrons in the QDs. (c) 2005 American Institute of Physics.en_US
dc.identifier.doi10.1063/1.2140891en_US
dc.identifier.issn0021-8979en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2140891en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/12975
dc.identifier.wosnumberWOS:000234119600036
dc.language.isoen_USen_US
dc.titleN incorporation into InGaAs cap layer in InAs self-assembled quantum dotsen_US
dc.typeArticleen_US

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