DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE
| dc.citation.epage | 1325 | en_US |
| dc.citation.issue | 22 | en_US |
| dc.citation.spage | 1323 | en_US |
| dc.citation.volume | 10 | en_US |
| dc.citation.woscount | 7 | |
| dc.contributor.author | CHIU, HT | en_US |
| dc.contributor.author | LEE, SF | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:05:05Z | |
| dc.date.available | 2014-12-08T15:05:05Z | |
| dc.date.issued | 1991-11-15 | en_US |
| dc.identifier.doi | 10.1007/BF00722649 | en_US |
| dc.identifier.issn | 0261-8028 | en_US |
| dc.identifier.journal | JOURNAL OF MATERIALS SCIENCE LETTERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1007/BF00722649 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/3633 | |
| dc.identifier.wosnumber | WOS:A1991GR01700011 | |
| dc.language.iso | en_US | en_US |
| dc.title | DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE | en_US |
| dc.type | Article | en_US |
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