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A simulated annealing algorithm for integration of shop floor control strategies in semiconductor wafer fabrication

dc.citation.epage88en_US
dc.citation.issue1-2en_US
dc.citation.spage75en_US
dc.citation.volume22en_US
dc.citation.woscount4
dc.contributor.authorSha, DYen_US
dc.contributor.authorLiu, CYen_US
dc.contributor.department工業工程與管理學系zh_TW
dc.contributor.departmentDepartment of Industrial Engineering and Managementen_US
dc.date.accessioned2014-12-08T15:40:23Z
dc.date.available2014-12-08T15:40:23Z
dc.date.issued2003-09-01en_US
dc.description.abstractThe semiconductor manufacturing industry is one of the most important industries in Taiwan. Wafer fabrication is an essential process in semiconductor manufacturing. However, controlling the production system on the shop floor is extremely difficult owing to the complicated manufacturing process and reentrant characteristics. In this paper, the shop floor control (SFC) integration strategies (order review/release, dispatching, and rework strategies) in wafer fabrication are considered with using several performances. We reviewed the literature on SFC strategies in wafer fabrication. The proposed combination simulation and simulated annealing (SA) algorithm is presented for SFC strategies in wafer fabrication. The objective was to seek the near global optimum solution for the combination of SFC strategies for a specific performance indicator. From the results, the proposed methodology was found to perform well for combinations of SFC strategies using different performance indicators in wafer fabrication. However, no single combination of SFC strategies could satisfy all performance indicators. Hence, considering the trade-off among these production control strategies, a suitable strategy should be chosen based on the system control tactics. Considerable computational time was saved in this research.en_US
dc.identifier.doi10.1007/s00170-002-1444-6en_US
dc.identifier.issn0268-3768en_US
dc.identifier.journalINTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGYen_US
dc.identifier.urihttp://dx.doi.org/10.1007/s00170-002-1444-6en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/27571
dc.identifier.wosnumberWOS:000185687700009
dc.language.isoen_USen_US
dc.subjectshop floor controlen_US
dc.subjectdispatchingen_US
dc.subjectorder review and releaseen_US
dc.subjectreworken_US
dc.subjectwafer fabricationen_US
dc.subjectsimulationen_US
dc.subjectsimulated annealingen_US
dc.titleA simulated annealing algorithm for integration of shop floor control strategies in semiconductor wafer fabricationen_US
dc.typeArticleen_US

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