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Observation of strong electron dephasing in highly disordered Cu93Ge4Au3 thin films

dc.citation.epage0en_US
dc.citation.issue4en_US
dc.citation.spage0en_US
dc.citation.volume99en_US
dc.citation.woscount19en_US
dc.contributor.authorHuang, S. M.en_US
dc.contributor.authorLee, T. C.en_US
dc.contributor.authorAkimoto, H.en_US
dc.contributor.authorKono, K.en_US
dc.contributor.authorLin, J. J.en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.date.accessioned2019-04-03T06:44:46Z
dc.date.available2019-04-03T06:44:46Z
dc.date.issued2007-07-27en_US
dc.description.abstractWe report the observation of strong electron dephasing in a series of disordered Cu93Ge4Au3 thin films. A very short electron dephasing time possessing very weak temperature dependence around 6 K, followed by an upturn with further decrease in temperature below 4 K, is found. The upturn is progressively more pronounced in more disordered samples. Moreover, a lnT-dependent, but high-magnetic-field-insensitive, resistance rise persisting from above 10 K down to 30 mK is observed in the films. These results suggest a nonmagnetic dephasing process which is stronger than any known mechanism and may originate from the coupling of conduction electrons to dynamic defects.en_US
dc.identifier.doi10.1103/PhysRevLett.99.046601en_US
dc.identifier.issn0031-9007en_US
dc.identifier.journalPHYSICAL REVIEW LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevLett.99.046601en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/10538
dc.identifier.wosnumberWOS:000248345800046en_US
dc.language.isoen_USen_US
dc.titleObservation of strong electron dephasing in highly disordered Cu93Ge4Au3 thin filmsen_US
dc.typeArticleen_US

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