Pure electron-electron dephasing in percolative aluminum ultrathin film grown by molecular beam epitaxy
| dc.citation.epage | 0 | en_US |
| dc.citation.spage | 0 | en_US |
| dc.citation.volume | 10 | en_US |
| dc.citation.woscount | 3 | en_US |
| dc.contributor.author | Lin, Shih-Wei | en_US |
| dc.contributor.author | Wu, Yue-Han | en_US |
| dc.contributor.author | Chang, Li | en_US |
| dc.contributor.author | Liang, Chi-Te | en_US |
| dc.contributor.author | Lin, Sheng-Di | en_US |
| dc.contributor.department | 材料科學與工程學系 | zh_TW |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Materials Science and Engineering | en_US |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2019-04-03T06:41:25Z | |
| dc.date.available | 2019-04-03T06:41:25Z | |
| dc.date.issued | 2015-02-18 | en_US |
| dc.description.abstract | We have successfully grown ultrathin continuous aluminum film by molecular beam epitaxy. This percolative aluminum film is single crystalline and strain free as characterized by transmission electron microscopy and atomic force microscopy. The weak anti-localization effect is observed in the temperature range of 1.4 to 10 K with this sample, and it reveals that, for the first time, the dephasing is purely caused by electron-electron inelastic scattering in aluminum. | en_US |
| dc.identifier.doi | 10.1186/s11671-015-0782-x | en_US |
| dc.identifier.issn | 1556-276X | en_US |
| dc.identifier.journal | NANOSCALE RESEARCH LETTERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1186/s11671-015-0782-x | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/124320 | |
| dc.identifier.wosnumber | WOS:000350566100001 | en_US |
| dc.language.iso | en_US | en_US |
| dc.subject | Weak anti-localization | en_US |
| dc.subject | Ultrathin metal films | en_US |
| dc.subject | Pure electron-electron dephasing | en_US |
| dc.title | Pure electron-electron dephasing in percolative aluminum ultrathin film grown by molecular beam epitaxy | en_US |
| dc.type | Article | en_US |