INFRARED SPECTROSCOPIC STUDY OF MERCURY-SENSITIZED PHOTO-CVD SILICON-OXIDE
| dc.citation.epage | 1003 | en_US |
| dc.citation.issue | 6 | en_US |
| dc.citation.spage | 997 | en_US |
| dc.citation.volume | 29 | en_US |
| dc.citation.woscount | 13 | |
| dc.contributor.author | LAN, WH | en_US |
| dc.contributor.author | TU, SL | en_US |
| dc.contributor.author | YANG, SJ | en_US |
| dc.contributor.author | HUANG, KF | en_US |
| dc.contributor.department | 電子物理學系 | zh_TW |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Electrophysics | en_US |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2014-12-08T15:05:33Z | |
| dc.date.available | 2014-12-08T15:05:33Z | |
| dc.date.issued | 1990-06-01 | en_US |
| dc.identifier.issn | 0021-4922 | en_US |
| dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4091 | |
| dc.identifier.wosnumber | WOS:A1990DM20800001 | |
| dc.language.iso | en_US | en_US |
| dc.title | INFRARED SPECTROSCOPIC STUDY OF MERCURY-SENSITIZED PHOTO-CVD SILICON-OXIDE | en_US |
| dc.type | Article | en_US |