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Dressed Linewidth Enhancement Factors in Small Semiconductor Lasers

dc.citation.epageen_US
dc.citation.issue6en_US
dc.citation.volume21en_US
dc.citation.woscount0
dc.contributor.authorChang, Shu-Weien_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:36:54Z
dc.date.available2014-12-08T15:36:54Z
dc.date.issued2015-11-01en_US
dc.description.abstractWe show that the linewidth of a semiconductor-based small laser, when operated above the threshold, might not directly reflect the permittivity variation induced by carriers in the gain material. In fact, the linewidth may be significantly dressed by responses of modal amplitudes to emitting sources if the small cavity is dispersive, lossy, leaky, spectrally-sharp in gain, but not necessarily intricately-structured. This dressing effect might reduce linewidth enhancements. Despite a large material linewidth enhancement factor, the source-amplitude response could still keep the enhancement effect mild.en_US
dc.identifier.doi10.1109/JSTQE.2014.2359542en_US
dc.identifier.issn1077-260Xen_US
dc.identifier.journalIEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JSTQE.2014.2359542en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25297
dc.identifier.wosnumberWOS:000343907500001
dc.language.isoen_USen_US
dc.titleDressed Linewidth Enhancement Factors in Small Semiconductor Lasersen_US
dc.typeArticleen_US

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