SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films.
| dc.citation.epage | A48 | en_US |
| dc.citation.issue | en_US | |
| dc.citation.spage | A48 | en_US |
| dc.citation.volume | 223 | en_US |
| dc.citation.woscount | 0 | |
| dc.contributor.author | Chiu, HT | en_US |
| dc.contributor.author | Chang, YH | en_US |
| dc.contributor.author | Wang, LS | en_US |
| dc.contributor.author | Peng, CW | en_US |
| dc.contributor.author | Lee, CY | en_US |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:42:30Z | |
| dc.date.available | 2014-12-08T15:42:30Z | |
| dc.date.issued | 2002-04-07 | en_US |
| dc.identifier.issn | 0065-7727 | en_US |
| dc.identifier.journal | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/28864 | |
| dc.identifier.wosnumber | WOS:000176296800285 | |
| dc.language.iso | en_US | en_US |
| dc.title | SiCl3CCl3 as a novel precursor for chemical vapor deposition of amorphous carbon films. | en_US |
| dc.type | Meeting Abstract | en_US |
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