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Suppression of the floating-body effect in poly-Si thin-film transistors with self-aligned Schottky barrier source and ohmic body contact structure

dc.citation.epage636en_US
dc.citation.issue9en_US
dc.citation.spage634en_US
dc.citation.volume25en_US
dc.citation.woscount12
dc.contributor.authorKuo, PYen_US
dc.contributor.authorChao, TSen_US
dc.contributor.authorLei, TFen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department奈米中心zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentNano Facility Centeren_US
dc.date.accessioned2014-12-08T15:38:37Z
dc.date.available2014-12-08T15:38:37Z
dc.date.issued2004-09-01en_US
dc.description.abstractIn this letter, we developed a new self-aligned Schottky barrier source and ohmic body contact (SSOB) method that can effectively suppress the floating-body effect in poly-Si thin-film transistors (TFTs). Experimental results,show that the SSOB-TFTs give higher output resistance, less threshold voltage variation, improved subthreshold characteristics, and larger breakdown voltage compared with conventional TFTs. The characteristics of the SSOB-TFTs are suitable for high-performance driving TFTs with a high output resistance and large breakdown voltage.en_US
dc.identifier.doi10.1109/LED.2004.834635en_US
dc.identifier.issn0741-3106en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2004.834635en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/26416
dc.identifier.wosnumberWOS:000223577600015
dc.language.isoen_USen_US
dc.subjectfloating-body effecten_US
dc.subjectkink effecten_US
dc.subjectohmic body contacten_US
dc.subjectpoly-Si TFTsen_US
dc.subjectSchottky barrier sourceen_US
dc.titleSuppression of the floating-body effect in poly-Si thin-film transistors with self-aligned Schottky barrier source and ohmic body contact structureen_US
dc.typeArticleen_US

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