0.25-0.35微米圖案轉移用石英蝕刻調細式相移光罩之最佳化模擬及其研製
| dc.contributor.author | 龍文安 | en_US |
| dc.contributor.author | Loong Wen-an | en_US |
| dc.contributor.department | 國立交通大學應用化學研究所 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:39:19Z | |
| dc.date.available | 2014-12-13T10:39:19Z | |
| dc.date.issued | 1995 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC84-2215-E009-051 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=172228&docId=29261 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/96348 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 0.25-0.35微米圖案轉移用石英蝕刻調細式相移光罩之最佳化模擬及其研製 | zh_TW |
| dc.title | Optimization by Simulation and Its Fabrication of a Quartz-Etch Attenuate Phase Shifting Mask for 0.25-0.35.mu.m Pattern Transfer | en_US |
| dc.type | Plan | en_US |
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