Low-frequency noise in partially depleted SOI MOSFETs operating from linear region to saturation region at various temperatures

dc.citation.epage2189en_US
dc.citation.issue4Ben_US
dc.citation.spage2188en_US
dc.citation.volume43en_US
dc.contributor.authorChen, KMen_US
dc.contributor.authorHu, HHen_US
dc.contributor.authorHuang, GWen_US
dc.contributor.authorYeh, WKen_US
dc.contributor.authorChang, CYen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:39:26Z
dc.date.available2014-12-08T15:39:26Z
dc.date.issued2004-04-01en_US
dc.description.abstractThe low-frequency noise characteristics of partially depleted metal-oxide-semiconductor field-effect transistors (MOSFETs) in silicon-on-insulator technology at various temperatures were investigated. For floating-body devices, a Lorentzian-like noise overshoot is observed due to the floating-body effect. The noise overshoot is dependent on temperature and bias, and can be reduced using a source-to-body-connected structure. At high temperature or high drain bias, the 1/f noise will be observed, and it is temperature-independent due to the trap-induced mobility fluctuation in the channel.en_US
dc.identifier.doi10.1143/JJAP.43.2188en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.43.2188en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/26922
dc.identifier.wosnumberWOS:000221510800119
dc.language.isoen_USen_US
dc.subjectlow-frequency noiseen_US
dc.subjectSOI MOSFETen_US
dc.subjectfloating-body effecten_US
dc.subjecttemperatureen_US
dc.subjectmobility fluctuationen_US
dc.titleLow-frequency noise in partially depleted SOI MOSFETs operating from linear region to saturation region at various temperaturesen_US
dc.typeArticle; Proceedings Paperen_US

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