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A light-induced tunneling state in a submicron double barrier tunneling diode with a center-doped well

dc.citation.epage334en_US
dc.citation.issue1-4en_US
dc.citation.spage331en_US
dc.citation.volume6en_US
dc.citation.woscount0
dc.contributor.authorSuen, YWen_US
dc.contributor.authorYoung, CCen_US
dc.contributor.authorChang, CJen_US
dc.contributor.authorWu, JCen_US
dc.contributor.authorWang, SYen_US
dc.contributor.authorLee, CPen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:45:42Z
dc.date.available2014-12-08T15:45:42Z
dc.date.issued2000-02-01en_US
dc.description.abstractWe will present the observation of a light-induced meta-stable impurity state in a submicron center-doped double barrier tunneling diode (DBRTD) manufactured by a novel single-step e-beam lithography process in which no further alignment for the interconnect between the bonding pad and the small active device region is required. We attribute the mete-stable tunneling state, which can be switched by light and high voltage bias, to the light- or field-induced charge redistribution in the active tunneling region. (C) 2000 Elsevier Science B.V. All rights reserved.en_US
dc.identifier.doi10.1016/S1386-9477(99)00166-6en_US
dc.identifier.issn1386-9477en_US
dc.identifier.journalPHYSICA Een_US
dc.identifier.urihttp://dx.doi.org/10.1016/S1386-9477(99)00166-6en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30744
dc.identifier.wosnumberWOS:000085770600080
dc.language.isoen_USen_US
dc.subjectdouble barrier tunneling diodeen_US
dc.subjectmagnetic fielden_US
dc.subjectimpurity stateen_US
dc.titleA light-induced tunneling state in a submicron double barrier tunneling diode with a center-doped wellen_US
dc.typeArticleen_US

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