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Vertical polymer phototransistor featuring photomultiplication due to base-field shielding

dc.citation.epageen_US
dc.citation.issue5en_US
dc.citation.volume98en_US
dc.citation.woscount6
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorTsai, Wu-Weien_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.department物理研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:37:36Z
dc.date.available2014-12-08T15:37:36Z
dc.date.issued2011-01-31en_US
dc.description.abstractWe introduce a vertical polymer phototransistor with low operational voltage (-1.5 V). A blended polymer layer with both acceptor and donor materials was used as a channel material in the vertical space-charge-limited transistor. Under illumination, we obtained external quantum efficiency (EQE) as high as 360% at 620 nm. We propose the effects of base-field shielding as a means to explain high EQE. This proposition has been supported by two-dimensional simulation of the device. (C) 2011 American Institute of Physics. [doi:10.1063/1.3552714]en_US
dc.identifier.doi10.1063/1.3552714en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3552714en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25861
dc.identifier.wosnumberWOS:000286988400075
dc.language.isoen_USen_US
dc.titleVertical polymer phototransistor featuring photomultiplication due to base-field shieldingen_US
dc.typeArticleen_US

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