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40-GHz coplanar waveguide bandpass filters on silicon substrate

dc.citation.epage431en_US
dc.citation.issue11en_US
dc.citation.spage429en_US
dc.citation.volume12en_US
dc.citation.woscount25
dc.contributor.authorChan, KTen_US
dc.contributor.authorChen, CYen_US
dc.contributor.authorChin, Aen_US
dc.contributor.authorHsieh, JCen_US
dc.contributor.authorLiu, Jen_US
dc.contributor.authorDuh, TSen_US
dc.contributor.authorLin, WJen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:41:48Z
dc.date.available2014-12-08T15:41:48Z
dc.date.issued2002-11-01en_US
dc.description.abstractWe report a very simple process to fabricate high performance filter on Si at 40 GHz; using proton implantation. The filter has only -3.4-dB loss at peak transmission of 40 GHz; with a broad 9-GHz bandwidth. In sharp contrast, the filter on 1.5-mum SiO2 isolated Si has much worse transmission and reflection loss. This is the first demonstration of high performance filter at millimeter-wave regime on Si with process compatible to current VLSI technology.en_US
dc.identifier.doi10.1109/LMWC.2002.805535en_US
dc.identifier.issn1531-1309en_US
dc.identifier.journalIEEE MICROWAVE AND WIRELESS COMPONENTS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/LMWC.2002.805535en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/28422
dc.identifier.wosnumberWOS:000179118100004
dc.language.isoen_USen_US
dc.title40-GHz coplanar waveguide bandpass filters on silicon substrateen_US
dc.typeArticleen_US

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