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Effects of doping in the active region of 630-nm band GaInP-AlGaInP tensile-strained quantum-well lasers

dc.citation.epage1651en_US
dc.citation.issue9en_US
dc.citation.spage1644en_US
dc.citation.volume34en_US
dc.citation.woscount10
dc.contributor.authorYen, STen_US
dc.contributor.authorLee, CPen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:48:46Z
dc.date.available2014-12-08T15:48:46Z
dc.date.issued1998-09-01en_US
dc.description.abstractWe theoretically analyze 630-nm band GaInP-AIGaInP tensile-strained quantum-well (QW) lasers with doping in the active region. The radiative current can be significantly reduced by introducing n-type doping in the active region. However, this advantage is reduced by the increase of the leakage current, As a result, the threshold current is reduced and the emission wavelength is shortened for multiquantum-well (MQW) lasers by n-type doping. But for single-quantum-well (SQW) lasers, because of the large increase of the leakage current, the threshold current increases with n-type doping.en_US
dc.identifier.doi10.1109/3.709580en_US
dc.identifier.issn0018-9197en_US
dc.identifier.journalIEEE JOURNAL OF QUANTUM ELECTRONICSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/3.709580en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/32436
dc.identifier.wosnumberWOS:000075486000014
dc.language.isoen_USen_US
dc.subjectdoped lasersen_US
dc.subjectquantum wellen_US
dc.subjectquantum-well lasersen_US
dc.subjectsemiconductor device modelingen_US
dc.subjectsemiconductor lasersen_US
dc.subjectspontaneous emissionen_US
dc.subjectvisible lasersen_US
dc.titleEffects of doping in the active region of 630-nm band GaInP-AlGaInP tensile-strained quantum-well lasersen_US
dc.typeArticleen_US

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