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Improvement of resistive switching characteristics in SrZrO3 thin films with embedded Cr layer

dc.citation.epage1111en_US
dc.citation.issue10en_US
dc.citation.spage1108en_US
dc.citation.volume29en_US
dc.citation.woscount24
dc.contributor.authorLin, Chih-Yangen_US
dc.contributor.authorLin, Meng-Hanen_US
dc.contributor.authorWu, Ming-Chien_US
dc.contributor.authorLin, Chen-Hsien_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:10:51Z
dc.date.available2014-12-08T15:10:51Z
dc.date.issued2008-10-01en_US
dc.description.abstractThe stabilization of the resistive switching properties is necessary to realize the memory application of the SrZrO3 (SZO)-based resistive switching devices. During continuous resistive switching cycle, broad variations of the resistive switching parameters of the SZO-based memory devices can be improved by a thin embedded Cr layer. The Cr metal layer is proposed to diffuse into and dope the SZO thin film to produce the space charge region, further reducing the effective resistive switching region. Hence, the good stabilization of the resistive switching properties can be obtained in the SZO films with embedded Cr layer.en_US
dc.identifier.doi10.1109/LED.2008.2002879en_US
dc.identifier.issn0741-3106en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2008.2002879en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/8304
dc.identifier.wosnumberWOS:000259812900008
dc.language.isoen_USen_US
dc.subjectnonvolatile memory (NVM)en_US
dc.subjectresistive random access memory (RRAM)en_US
dc.subjectresistive switchingen_US
dc.subjectstabilizationen_US
dc.subjectSrZrO3en_US
dc.titleImprovement of resistive switching characteristics in SrZrO3 thin films with embedded Cr layeren_US
dc.typeArticleen_US

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