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Enhanced light output power of GaN-based vertical-injection light-emitting diodes with a 12-fold photonic quasi-crystal by nano-imprint lithography

dc.citation.epageen_US
dc.citation.issue8en_US
dc.citation.volume24en_US
dc.citation.woscount26
dc.contributor.authorHuang, H. W.en_US
dc.contributor.authorLin, C. H.en_US
dc.contributor.authorLee, K. Y.en_US
dc.contributor.authorYu, C. C.en_US
dc.contributor.authorHuang, J. K.en_US
dc.contributor.authorLee, B. D.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorLeung, K. M.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:08:58Z
dc.date.available2014-12-08T15:08:58Z
dc.date.issued2009-08-12en_US
dc.description.abstractGaN-based thin-film vertical-injection light-emitting diodes (VLEDs) with a 12-fold photonic quasi-crystal (PQC) by nano-imprint lithography (NIL) are fabricated and presented. At a driving current of 20 mA and with a chip size of 350 mu m x 350 mu m, the light output power of our thin-film LED with a 12-fold PQC structure reaches 41 mW. This result is an enhancement of 78% when compared with the output power of a VLED without a PQC structure. In addition, the corresponding light radiation pattern shows a narrower beam shape due to the strong guided light extraction effect by the formed PQC structure in the vertical direction.en_US
dc.identifier.doi10.1088/0268-1242/24/8/085008en_US
dc.identifier.issn0268-1242en_US
dc.identifier.journalSEMICONDUCTOR SCIENCE AND TECHNOLOGYen_US
dc.identifier.urihttp://dx.doi.org/10.1088/0268-1242/24/8/085008en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6821
dc.identifier.wosnumberWOS:000268301000008
dc.language.isoen_USen_US
dc.titleEnhanced light output power of GaN-based vertical-injection light-emitting diodes with a 12-fold photonic quasi-crystal by nano-imprint lithographyen_US
dc.typeArticleen_US

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