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Ultraviolet emission efficiency enhancement of a-plane AlGaN/GaN multiple-quantum-wells with increasing quantum well thickness

dc.citation.epageen_US
dc.citation.issue26en_US
dc.citation.volume100en_US
dc.citation.woscount4
dc.contributor.authorHuang, Huei-Minen_US
dc.contributor.authorChang, Chiao-Yunen_US
dc.contributor.authorLan, Yu-Pinen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorWang, Shing-Chungen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:23:34Z
dc.date.available2014-12-08T15:23:34Z
dc.date.issued2012-06-25en_US
dc.description.abstractThe defect-induced carrier localization in nonpolar a-plane (Al,Ga)N/GaN multiple quantum wells (MQWs) structures with different well thickness have been investigated. A strong variation of temperature-dependent photoluminescence peak energy was observed and attributed to the existence of the localized states. The degree of carrier localization in these defect-induced states was more prominent in the case of MQWs with the wider well width. In addition, the ultraviolet light emission efficiency revealed a 3-fold enhancement with increasing the well width from 1.6 nm to 7.3 nm, due to the strong carrier localization generated from the quantum-wire-like features formed by the intersection between basal stacking faults and quantum wells. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4730438]en_US
dc.identifier.doi261901en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/261901en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/16471
dc.identifier.wosnumberWOS:000305831500018
dc.language.isoen_USen_US
dc.titleUltraviolet emission efficiency enhancement of a-plane AlGaN/GaN multiple-quantum-wells with increasing quantum well thicknessen_US
dc.typeArticleen_US

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