快速熱程序設備動態模式建立參數判別及溫度控制(III)
| dc.contributor.author | 林清安 | en_US |
| dc.contributor.author | LIN CHING-AN | en_US |
| dc.contributor.department | 交通大學電機與控制工程系 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:37:14Z | |
| dc.date.available | 2014-12-13T10:37:14Z | |
| dc.date.issued | 1999 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC88-2218-E009-005 | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=430078&docId=77027 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/94475 | |
| dc.language.iso | zh_TW | en_US |
| dc.subject | 快速熱處理 | zh_TW |
| dc.subject | 溫度控制 | zh_TW |
| dc.subject | 參數識別 | zh_TW |
| dc.subject | 晶圓表面 | zh_TW |
| dc.subject | 線性矩陣不等式 | zh_TW |
| dc.subject | 熱源 | zh_TW |
| dc.subject | Rapid thermal processing (RTP) | en_US |
| dc.subject | Temperature control | en_US |
| dc.subject | Parameter identification | en_US |
| dc.subject | Wafer surface | en_US |
| dc.subject | Linear matrix inequality | en_US |
| dc.subject | Heat source | en_US |
| dc.title | 快速熱程序設備動態模式建立參數判別及溫度控制(III) | zh_TW |
| dc.title | Thermal Process Modelling Parameter Identification and Temperature Control in Rapid Thermal Processing Equipments(III) | en_US |
| dc.type | Plan | en_US |