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Instant Cu-to-Cu direct bonding enabled by < 111 >-oriented nanotwinned Cu bumps

dc.citation.epage0en_US
dc.citation.spage0en_US
dc.citation.volume59en_US
dc.citation.woscount0en_US
dc.contributor.authorShie, Kai Chengen_US
dc.contributor.authorJuang, Jing-Yeen_US
dc.contributor.authorChen, Chihen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2020-05-05T00:02:23Z
dc.date.available2020-05-05T00:02:23Z
dc.date.issued2020-02-01en_US
dc.description.abstractCu-to-Cu direct bonding was successfully achieved in 10 s with < 111 >-oriented nanotwinned Cu (nt-Cu) bumps in ambient N-2. The bonding temperature and pressure were 300 degrees C and 90 MPa, respectively. A nearly void-free interface and a low bump resistance of 4.9 m Omega can be observed after a short-time bonding process. Besides, longer bonding times of 60 s and 30 s were employed, but the resistances of the Cu joints did not decrease significantly when the bonding time increased to 60 s. However, the nt-Cu columnar grains started to recrystallize during the 60 s bonding and started detwinning in 10 s bonding. Yet, the bonding interface remained under such a short bonding time. (C) 2019 The Japan Society of Applied Physicsen_US
dc.identifier.doi10.7567/1347-4065/ab5697en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.7567/1347-4065/ab5697en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/154196
dc.identifier.wosnumberWOS:000520010700004en_US
dc.language.isoen_USen_US
dc.titleInstant Cu-to-Cu direct bonding enabled by < 111 >-oriented nanotwinned Cu bumpsen_US
dc.typeArticleen_US

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