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Simulation study of type-II Ge/Si quantum dot for solar cell applications

dc.citation.epageen_US
dc.citation.issue12en_US
dc.citation.volume114en_US
dc.citation.woscount1
dc.contributor.authorHu, Weiguoen_US
dc.contributor.authorRahman, Mohammad Maksuduren_US
dc.contributor.authorLee, Ming-Yien_US
dc.contributor.authorLi, Yimingen_US
dc.contributor.authorSamukawa, Seijien_US
dc.contributor.department電機資訊學士班zh_TW
dc.contributor.departmentUndergraduate Honors Program of Electrical Engineering and Computer Scienceen_US
dc.date.accessioned2014-12-08T15:33:04Z
dc.date.available2014-12-08T15:33:04Z
dc.date.issued2013-09-28en_US
dc.description.abstractThe electronic structure, miniband formation conditions, and required process parameters of type-II Ge/Si quantum dots are calculated using a 3D finite element method. We further estimate the device conversion efficiency and optimize the appropriate operation conditions. By using the crystalline silicon as the matrix, the explored intermediate band solar cell (IBSC) may not be suitable for 1 sun application, but it is a great value under concentration application. By considering an appropriate H-passivation treatment on amorphous silicon, the type II Ge/Si IBSC can achieve 44.0% conversion efficiency under 1 sun application. (C) 2013 AIP Publishing LLC.en_US
dc.identifier.doi10.1063/1.4821114en_US
dc.identifier.issn0021-8979en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4821114en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/23021
dc.identifier.wosnumberWOS:000325391100072
dc.language.isoen_USen_US
dc.titleSimulation study of type-II Ge/Si quantum dot for solar cell applicationsen_US
dc.typeArticleen_US

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