HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE
| dc.citation.epage | 539 | en_US |
| dc.citation.issue | 8 | en_US |
| dc.citation.spage | 537 | en_US |
| dc.citation.volume | 12 | en_US |
| dc.citation.woscount | 9 | |
| dc.contributor.author | CHIU, HT | en_US |
| dc.contributor.author | HUANG, SC | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:04:33Z | |
| dc.date.available | 2014-12-08T15:04:33Z | |
| dc.date.issued | 1993-04-15 | en_US |
| dc.identifier.issn | 0261-8028 | en_US |
| dc.identifier.journal | JOURNAL OF MATERIALS SCIENCE LETTERS | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/3049 | |
| dc.identifier.wosnumber | WOS:A1993KZ35100005 | |
| dc.language.iso | en_US | en_US |
| dc.title | HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE | en_US |
| dc.type | Article | en_US |
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