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Improved hot carrier reliability in strained-channel NMOSFETS with TEOS buffer layer

dc.citation.epage671en_US
dc.citation.spage670en_US
dc.contributor.authorLu, Ching-Senen_US
dc.contributor.authorLin, Horng-Chihen_US
dc.contributor.authorLee, Yao-Jenen_US
dc.contributor.authorHuang, Tiao-Yuanen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:09:26Z
dc.date.available2014-12-08T15:09:26Z
dc.date.issued2007en_US
dc.identifier.doi10.1109/RELPHY.2007.369562en_US
dc.identifier.isbn978-1-4244-0918-1en_US
dc.identifier.journal2007 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 45TH ANNUALen_US
dc.identifier.urihttp://dx.doi.org/10.1109/RELPHY.2007.369562en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/7212
dc.identifier.wosnumberWOS:000246989600146
dc.language.isoen_USen_US
dc.titleImproved hot carrier reliability in strained-channel NMOSFETS with TEOS buffer layeren_US
dc.typeArticleen_US

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