薄膜超導元件的研製與特性探討---子計畫V：雷射鍍膜法中臨場監控超導薄膜生長之研究(II)

dc.contributor.author	吳光雄	en_US
dc.contributor.author	WU KAUNG-HSIUNG	en_US
dc.contributor.department	交通大學電子物理系	zh_TW
dc.date.accessioned	2014-12-13T10:38:43Z
dc.date.available	2014-12-13T10:38:43Z
dc.date.issued	1997	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC86-2112-M009-031	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=287921&docId=52354	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/95601
dc.language.iso	zh_TW	en_US
dc.subject	臨場監控	zh_TW
dc.subject	超導薄膜成長	zh_TW
dc.subject	反射式高能電子繞射儀	zh_TW
dc.subject	脈衝雷射蒸鍍	zh_TW
dc.subject	in situ monitoring	en_US
dc.subject	Superconducting thin film growth	en_US
dc.subject	Reflective high energy electron diffraction (RHEED)	en_US
dc.subject	Pulsed laser deposition (PLD)	en_US
dc.title	薄膜超導元件的研製與特性探討---子計畫V：雷射鍍膜法中臨場監控超導薄膜生長之研究(II)	zh_TW
dc.title	In-situ Monitoring of Superconducting Film Growth in Pulsed Laser Deposition (Ⅱ)	en_US
dc.type	Plan	en_US

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