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薄膜超導元件的研製與特性探討---子計畫V:雷射鍍膜法中臨場監控超導薄膜生長之研究(II)
薄膜超導元件的研製與特性探討---子計畫V:雷射鍍膜法中臨場監控超導薄膜生長之研究(II)
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Date
1997
Authors
吳光雄
WU KAUNG-HSIUNG
Journal Title
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Volume Title
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Description
Keywords
臨場監控
,
超導薄膜成長
,
反射式高能電子繞射儀
,
脈衝雷射蒸鍍
,
in situ monitoring
,
Superconducting thin film growth
,
Reflective high energy electron diffraction (RHEED)
,
Pulsed laser deposition (PLD)
Citation
URI
https://www.grb.gov.tw/search/planDetail?id=287921&docId=52354
https://ir.lib.nycu.edu.tw/handle/11536/95601
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