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Dual gate indium-gallium-zinc-oxide thin film transistor with an unisolated floating metal gate for threshold voltage modulation and mobility enhancement

dc.citation.epageen_US
dc.citation.issue15en_US
dc.citation.volume98en_US
dc.citation.woscount27
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorChen, Wei-Tsungen_US
dc.contributor.authorYeh, Chung-Chengen_US
dc.contributor.authorHsueh, Hsiu-Wenen_US
dc.contributor.authorTsai, Chuang-Chuangen_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.department物理研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:11:45Z
dc.date.available2014-12-08T15:11:45Z
dc.date.issued2011-04-11en_US
dc.description.abstractIn this study, we propose a floating dual gate (FDG) indium-gallium-zinc-oxide (IGZO) thin film transistor (TFT) with a floating metal back gate that is directly contact with IGZO without a dielectric layer. The floating back gate effect is investigated by changing the work function (phi) of the back gate. The FDG IGZO TFT exhibits an improved field-effect mobility (mu), unchanged subthreshold swing (SS), high on/off current ratio, and a tunable threshold voltage ranged (V(th)) from -5.0 to + 7.9 V without an additional back gate power supply. (C) 2011 American Institute of Physics. [doi:10.1063/1.3578403]en_US
dc.identifier.doi10.1063/1.3578403en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3578403en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/9007
dc.identifier.wosnumberWOS:000289580800072
dc.language.isoen_USen_US
dc.titleDual gate indium-gallium-zinc-oxide thin film transistor with an unisolated floating metal gate for threshold voltage modulation and mobility enhancementen_US
dc.typeArticleen_US

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