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The Metal-Oxide-Semiconductor(MOS)Field-Effect Transistors

dc.citation.epage84en_US
dc.citation.issue1en_US
dc.citation.spage60en_US
dc.citation.volume2en_US
dc.contributor.author陳龍英zh_TW
dc.contributor.authorL.I.Chenen_US
dc.date.accessioned2017-10-06T06:17:33Z
dc.date.available2017-10-06T06:17:33Z
dc.date.issued1966-10en_US
dc.description.abstractThe operation theory of MOS field-effect transistors based on some simplifying assumptions are analyzed. Then a simple method is presented to determine the effective surface carrier mobility, the parasitic resistance in the source region, and the transconductance in the saturation region. Some curves which are necessary in the method are plotted. The saturation drain current and gate voltage of these curves are normalized to the zero bias saturation drain current and pinch-off voltage respectively, thus this method is valid for different kinds of MOS transistors. The curves show that the parasitic resistance may be neglected for most of the practical MOS transistors.en_US
dc.identifier.journal交大學刊zh_TW
dc.identifier.journalSCIENCE BULLETIN NATIONAL CHIAO-TUNG UNIVERSITYen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/137423
dc.language.isoen_USen_US
dc.publisher交大學刊編輯委員會zh_TW
dc.titleThe Metal-Oxide-Semiconductor(MOS)Field-Effect Transistorsen_US
dc.typeCampus Publicationsen_US

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