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Issue DateTitleAuthor(s)
1-Nov-2004Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithographyChen, JK; Ko, FH; Hsieh, KF; Chou, CT; Chang, FC; 材料科學與工程學系奈米科技碩博班; 應用化學系; 奈米中心; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Applied Chemistry; Nano Facility Center
1999Evaluation of impurity migration and microwave digestion methods for lithographic materialsKo, FH; Hsiao, LT; Chou, CT; Wang, MY; Wang, TK; Sun, YC; Cheng, BJ; Yeng, S; Dai, BT; 奈米中心; Nano Facility Center
3-Mar-2006Fabrication of biomimetic super-amphiphobic surfaces through plasma modification of benzoxazine filmsWang, CF; Chiou, SF; Ko, FH; Chou, CT; Lin, HC; Huang, CF; Chang, FC; 材料科學與工程學系奈米科技碩博班; 應用化學系; Graduate Program of Nanotechnology , Department of Materials Science and Engineering; Department of Applied Chemistry
2000Film characterization and evaluation of process performance for the modified electron beam resistKo, FH; Ting, JH; Chou, CT; Hsiao, LT; Huang, TY; Dai, BT; 奈米中心; Nano Facility Center
1-Jan-1997Low temperature epitaxy of Si and Si1-xGex by utrahigh vacuum-chemical molecular epitaxyHuang, GW; Chen, LP; Chou, CT; Chen, KM; Tseng, HC; Tasi, WC; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
Showing results 1 to 5 of 5