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Showing results 1 to 6 of 6
Issue DateTitleAuthor(s)
1-Aug-2002Degradation of passivated and non-passivated N-channel low-temperature polycrystalline silicon TFTs prepared by excimer laser processingTeng, TH; Huang, CY; Chang, TK; Lin, CW; Cheng, LJ; Lu, YL; Cheng, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Apr-2001Effect of temperature and illumination on the instability of a-Si : H thin-film transistors under AC gate bias stressHuang, CY; Teng, TH; Yang, CJ; Tseng, CH; Cheng, HC; 奈米中心; Nano Facility Center
2000Effect of TiN treated by rapid thermal annealing on properties of BST capacitors prepared by RF magnetron co-sputter system at low substrate temperatureTeng, TH; Hwang, CC; Lai, MJ; Huang, SC; Chen, JS; Jaing, CC; Cheng, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Jul-2000The instability mechanisms of hydrogenated amorphous silicon thin film transistors under AC bias stressHuang, CY; Teng, TH; Tsai, JW; Cheng, HC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Aug-2002Study on dopant activation of phosphorous implanted polycrystalline silicon thin films by KrF excimer laser annealingTseng, CH; Lin, CW; Teng, TH; Chang, TK; Cheng, HC; Chin, A; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-Oct-2000Turnaround phenomenon of threshold voltage shifts in amorphous silicon thin film transistors under negative bias stressHuang, CY; Tsai, JW; Teng, TH; Yang, CJ; Cheng, HC; 奈米中心; Nano Facility Center
Showing results 1 to 6 of 6