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Showing results 1 to 6 of 6
Issue DateTitleAuthor(s)
16-Oct-2000Characterization of excimer-laser-annealed polycrystalline silicon films grown by ultrahigh-vacuum chemical vapor depositionChen, YC; Wu, YCS; Tung, IC; Chao, CW; Feng, MS; Chen, HC; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-Nov-1999Effects of methyl silsesquioxane electron-beam curing on device characteristics of logic and four-transistor static random-access memoryLin, CF; Tung, IC; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
1-Jul-1999Effects of O-2- and N2O-plasma treatments on properties of plasma-enhanced-chemical-vapor-deposition tetraethylorthosilicate oxideChen, YC; Yang, MZ; Tung, IC; Chen, MP; Feng, MS; Cheng, HC; Chang, CY; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
15-Oct-1999Nitric acid-based slurry with citric acid as an inhibitor for copper chemical mechanical polishingHu, TC; Chiu, SY; Dai, BT; Tsai, MS; Tung, IC; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
2000Study on chemical-mechanical polishing of low dielectric constant polyimide thin filmsTai, YL; Tsai, MS; Tung, IC; Dai, BT; Feng, MS; 材料科學與工程學系; Department of Materials Science and Engineering
1999A study on electrochemical metrologies for evaluating the removal selectivity of AlCMPChiu, SY; Hsu, JW; Tung, IC; Shih, HC; Feng, MS; Tsai, MS; Dai, BT; 材料科學與工程學系; Department of Materials Science and Engineering
Showing results 1 to 6 of 6