瀏覽 的方式: 作者 Chang, Wei-Yuan

跳到: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
或是輸入前幾個字:  
顯示 1 到 9 筆資料,總共 9 筆
公開日期標題作者
1-十一月-2018Broadband UV-assisted thermal annealing of low-k silicon carbonitride films using a C-rich silazane precursorChang, Wei-Yuan; Chung, Hau-Ting; Chen, Yi-Chang; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-一月-2013Effect of Moisture on Electrical and Reliability Characteristics for Dense and Porous Low-k DielectricsCheng, Yi-Lung; Huang, Jun-Fu; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-二月-2014Effect of moisture on electrical properties and reliability of low dielectric constant materialsCheng, Yi-Lung; Leon, Ka-Wai; Huang, Jun-Fu; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
1-五月-2014Effect of NH3/N-2 ratio in plasma treatment on porous low dielectric constant SiCOH materialsHuang, Jun-Fu; Bo, Tain-Cih; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; Cheng, Yi-Lung; 材料科學與工程學系; Department of Materials Science and Engineering
15-一月-2013Effect of thermal treatment on physical, electrical properties and reliability of porogen-containing and porogen-free ultralow-k dielectricsChang, Yu-Min; Chang, Wei-Yuan; Huang, Jun-Fu; Leu, Jihperng; Cheng, Yi-Lung; 材料科學與工程學系; Department of Materials Science and Engineering
1-十一月-2014Effect of UV curing time on physical and electrical properties and reliability of low dielectric constant materialsKao, Kai-Chieh; Chang, Wei-Yuan; Chang, Yu-Min; Leu, Jihperng; Cheng, Yi-Lung; 材料科學與工程學系; Department of Materials Science and Engineering
1-七月-2019Embedded carbon bridges in low-k PECVD silicon carbonitride films using silazane precursorsChang, Wei-Yuan; Chen, Wei-Zhong; Lee, Hung-Tse; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering
2013Modeling Transaction Costs and Skewness in Portfolio: Application of Fuzzy ApproachYu, Jing-Rung; Chiou, Wan-Jiun Paul; Chang, Wei-Yuan; Lee, Wen-Yi; 科技管理研究所; Institute of Management of Technology
31-八月-2017Optical properties of plasma-enhanced chemical vapor deposited SiCxNy films by using silazane precursorsChang, Wei-Yuan; Chang, Chieh-Yu; Leu, Jihperng; 材料科學與工程學系; Department of Materials Science and Engineering