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公開日期標題作者
1-一月-2005Characterization of prototype silicon pitch artifacts fabricated by scanning probe lithography and anisotropic wet etchingChien, FSS; Hsieh, WF; Gwo, S; Jun, J; Silver, RM; Vladar, AE; Dagata, JA; 光電工程學系; Department of Photonics
1-七月-1999Improved electrical characteristics of CoSi2 using HF-vapor pretreatmentWu, YH; Chen, WJ; Chang, SL; Chin, A; Gwo, S; Tsai, C; 物理研究所; 電子工程學系及電子研究所; Institute of Physics; Department of Electronics Engineering and Institute of Electronics
1-五月-1999Improved electrical characteristics of CoSi2 using HF-vapor pretreatmentWu, YH; Chen, WJ; Chang, SL; Chin, A; Gwo, S; Tsai, C; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-五月-1999Improved electrical characteristics of CoSi2 using HF-vapor pretreatmentWu, YH; Chen, WJ; Chang, SL; Chin, A; Gwo, S; Tsai, C; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-二月-2001Nano-oxidation of silicon nitride films with an atomic force microscope: Chemical mapping, kinetics, and applicationsChien, FSS; Chou, YC; Chen, TT; Hsieh, WF; Chao, TS; Gwo, S; 光電工程學系; Department of Photonics
18-十月-1999Nanomachining of (110)-oriented silicon by scanning probe lithography and anisotropic wet etchingChien, FSS; Wu, CL; Chou, YC; Chen, TT; Gwo, S; Hsieh, WF; 光電工程學系; Department of Photonics
17-一月-2000Nanometer-scale conversion of Si3N4 to SiOxChien, FSS; Chang, JW; Lin, SW; Chou, YC; Chen, TT; Gwo, S; Chao, TS; Hsieh, WF; 光電工程學系; Department of Photonics
15-六月-2002Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etchingChien, FSS; Hsieh, WF; Gwo, S; Vladar, AE; Dagata, JA; 光電工程學系; Department of Photonics