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公開日期標題作者
2009Characteristics Variability of Novel Lateral Asymmetry Nano-MOSFETs due to Random Discrete DopantLee, Kou-Fu; Hwang, Chih-Hong; Li, Tien-Yeh; Li, Yiming; 電信工程研究所; Institute of Communications Engineering
2008Comprehensive Examination of Threshold Voltage Fluctuations in Nanoscale Planar MOSFET and Bulk FinFET DevicesHwang, Chih-Hong; Cheng, Hui-Wen; Yeh, Ta-Ching; Li, Tien-Yeh; Huang, Hsuan-Ming; Li, Yiming; 電信工程研究所; Institute of Communications Engineering
1-五月-2009Discrete-Dopant-Induced Timing Fluctuation and Suppression in Nanoscale CMOS CircuitLi, Yiming; Hwang, Chih-Hong; Li, Tien-Yeh; 電信工程研究所; Institute of Communications Engineering
15-七月-2009The geometric effect and programming current reduction in cylindrical-shaped phase change memoryLi, Yiming; Hwang, Chih-Hong; Li, Tien-Yeh; Cheng, Hui-Wen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2009Process- and Random-Dopant-Induced Characteristic Variability of SRAM with nano-CMOS and Bulk FinFET DevicesLi, Tien-Yeh; Hwang, Chih-Hong; Li, Yiming; 電信工程研究所; Institute of Communications Engineering
1-二月-2010Process-Variation Effect, Metal-Gate Work-Function Fluctuation, and Random-Dopant Fluctuation in Emerging CMOS TechnologiesLi, Yiming; Hwang, Chih-Hong; Li, Tien-Yeh; Han, Ming-Hung; 傳播研究所; 電機工程學系; Institute of Communication Studies; Department of Electrical and Computer Engineering
2009Process-Variation- and Random-Dopant-Induced Static Noise Margin Fluctuation in Nanoscale CMOS and FinFET SRAM CellsLi, Tien-Yeh; Hwang, Chih-Hong; Li, Yiming; 電信工程研究所; Institute of Communications Engineering
1-八月-2009Random-Dopant-Induced Variability in Nano-CMOS Devices and Digital CircuitsLi, Yiming; Hwang, Chih-Hong; Li, Tien-Yeh; 電信工程研究所; Institute of Communications Engineering
2008Reduction of Discrete-Dopant-Induced High-Frequency Characteristic Fluctuations in Nanoscale CMOS CircuitLi, Yiming; Hwang, Chih-Hong; Yeh, Ta-Ching; Huang, Hsuan-Ming; Li, Tien-Yeh; Cheng, Hui-Wen; 電信工程研究所; Institute of Communications Engineering
2009Statistical Analysis of Metal Gate Workfunction Variability, Process Variation, and Random Dopant Fluctuation in Nano-CMOS CircuitsHwang, Chih-Hong; Li, Tien-Yeh; Han, Ming-Hung; Lee, Kuo-Fu; Cheng, Hui-Wen; Li, Yiming; 傳播研究所; Institute of Communication Studies
2008奈米級靜態隨機存取記憶體之特性擾動及其壓抑技術李典燁; Li, Tien-Yeh; 李義明; Li, Yiming; 電信工程研究所