標題: | Process- and Random-Dopant-Induced Characteristic Variability of SRAM with nano-CMOS and Bulk FinFET Devices |
作者: | Li, Tien-Yeh Hwang, Chih-Hong Li, Yiming 電信工程研究所 Institute of Communications Engineering |
關鍵字: | static noise margin;static random access memory;metal-oxide-semiconductor field-effect-transistor;fin-type field-effect-transistor;random dopant fluctuation;process variation effect |
公開日期: | 2009 |
摘要: | In this study, a three-dimensional "atomistic" circuit-device coupled simulation approach is advanced to investigate the process-variation and random dopant induced characteristic fluctuations in planar metal-oxide-semiconductor field-effect-transistor (MOSFET) static random access memory (SRAM) from 65-nm to 16-nm gate length. As the gate length of the planar MOSFETs scales from 65 nm to 16 nm, the SNM fluctuation increases from 4% to 27%. To reduce the device variability induced fluctuation in circuit, a 16-nm-gate silicon-on-insulator fin-type field-effect-transistor (FinFET) with aspect ratio (fin height / fin width) equal to two is investigated. Due to its superior electrostatic integrity and larger effective device width, the fluctuation of SNM of 16-nm-gate FinFET SRAM could be suppressed by five times. Comparing with the 65 nm planar MOSFET SRAM, FinFETs' SRAM is promising in aggressively scaled silicon technology. |
URI: | http://hdl.handle.net/11536/16704 |
ISBN: | 978-1-4398-1782-7 |
期刊: | NANOTECH CONFERENCE & EXPO 2009, VOL 1, TECHNICAL PROCEEDINGS |
起始頁: | 586 |
結束頁: | 589 |
顯示於類別: | 會議論文 |