瀏覽 的方式: 作者 Lo, Wen-Cheng

跳到: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
或是輸入前幾個字:  
顯示 1 到 9 筆資料,總共 9 筆
公開日期標題作者
1-七月-2008Carrier transportation mechanism of the TaN/HfO(2)/IL/Si structure with silicon surface fluorine implantationWu, Woei Cherng; Lai, Chao-Sung; Wang, Tzu-Ming; Wang, Jer-Chyi; Hsu, Chih Wei; Ma, Ming Wen; Lo, Wen-Cheng; Chao, Tien Sheng; 電子物理學系; Department of Electrophysics
2008Fluorinated HfO2 Gate Dielectrics Engineering for CMOS by pre- and post-CF4 Plasma PassivationWu, Woei-Chemg; Lai, Chao-Sung; Lee, Shih-Ching; Ma, Ming-Wen; Chao, Tien-Sheng; Wang, Jer-Chyi; Hsu, Chih-Wei; Chou, Pai-Chi; Chen, Jian-Hao; Kao, Kuo-Hsing; Lo, Wen-Cheng; Lu, Tsung-Yi; Tay, Li-Lin; Rowell, Nelson; 電子物理學系; Department of Electrophysics
2008Performance and interface characterization for contact etch stop layer-strained nMOSFET with HfO2 gate dielectrics under pulsed-IV measurementWu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; 電子物理學系; Department of Electrophysics
1-九月-2007Performance enhancement by local strain in (110) channel n-channel metal-oxide-semicondiactor field-effect transistors on (111) substrateLo, Wen-Cheng; Ku, Ya-Hsin; Lee, Yao-Jen; Chao, Tien-Sheng; Chang, Chun-Yen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2007Performance enhancement for strained HfO(2) nMOSFET with contact etch stop layer (CESL) under pulsed-IV measurementWu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; Ho, Yi-Hsun; 電子物理學系; Department of Electrophysics
1-十二月-2008Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO(2) nMOSFETWu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; 電子物理學系; Department of Electrophysics
1-十二月-2008Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO2 nMOSFETWu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; 電子物理學系; 電子工程學系及電子研究所; Department of Electrophysics; Department of Electronics Engineering and Institute of Electronics
1-三月-2007Systematical study of reliability issues in plasma-nitrided and thermally nitrided oxides for advanced dual-gate oxide p-channel metal-oxide-semiconductor field-effect transistorsLo, Wen-Cheng; Wu, Shien-Yang; Chang, Sun-Jay; Chiang, Mu-Chi; Lin, Chih-Yung; Chao, Tien-Sheng; Chang, Chun-Yen; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2008Trapping and de-trapping characteristics in PBTI and dynamic PBTI between HfO2 and HfSiON gate dielectricsLin, We-Liang; Lee, Yao-Jen; Lo, Wen-Cheng; Chen, King-Sheng; Hou, Y. T.; Lin, K. C.; Chao, Tien-Sheng; 電子物理學系; Department of Electrophysics